Small-Batch ALD Coatings for Prototypes and R&D
Test the idea before committing to production
Atomic Layer Deposition is a thin-film coating process known for producing highly uniform, conformal coatings with precise thickness control.
Because the coating forms through sequential surface reactions, ALD can provide coverage across complex shapes, recessed features, internal surfaces, and other geometries that may be difficult to coat uniformly using line-of-sight deposition methods.
ALD may be a strong fit when your project requires:
Uniform coverage on complex geometries
Precise control of coating thickness
Thin, conformal barrier layers
Coating of small or non-standard samples
Early-stage material or design evaluation
Prototype quantities before production development
Prototype Quantities
Small-batch ALD coating may be useful for:
Test coupons • Prototype components • Small wafer batches • Sensors and electronic surfaces • Medical device components • Optical components • Aerospace and space hardware • Proof-of-concept samples • Research and university projects
ALD Coatings
Our goal is to provide a practical path for customers who need enough coated material to evaluate an idea, generate data, or make the next engineering decision.
Aluminum Oxide — Al₂O₃
Al₂O₃ is one of the most widely used ALD materials. It can provide a thin, conformal barrier layer while also offering useful dielectric and passivation properties.
Potential applications include:
Moisture and environmental barriers
Surface passivation
Dielectric layers
Electrical insulation
Corrosion and surface protection
Sensor and semiconductor applications
Titanium Dioxide — TiO₂
TiO₂ is a ceramic thin film used across optical, electronic, sensing, and surface-functional applications.
Potential applications include:
Dielectric layers
Optical surfaces
Sensor components
Photocatalytic surfaces
Surface functionalization
Protective ceramic films
